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Company visit ASML with lecture & Demo.

12 oktober 2017
15:30 uur - 18:30 uur
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Voeg toe aan je agenda 12/10/2017 15:30 12/10/2017 18:30 Europe/Amsterdam Company visit ASML with lecture & Demo. Company visit with lecture and demonstration at ASML, with lecture of the Extreme Ultraviolet lithography (EUVL) and power electronics, Experience center and meet the Young ASML Limburg Elektrotechniek congresbureau@kivi.nl false DD/MM/YYYY

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ASML Experience Center and Young ASML Engineers

Short report on the visit of KIVI-EL to ASML on October 12, 2017:

ASML Veldhoven site

Indeed an impressive site in Veldhoven close to the highway towards Antwerp. The high-rise central building and next to it all the labs and office buildings. And next to those the cleanroom production facilities.

We were hosted by Maarten Hoeks (Manager Electrical Architecture Group) and Jeroen van Duivenbode (Competence Leader Power and High Voltage Electronics and Fellow at TUe Department of Electrical Engineering).

The site houses about 1/3 of the ASML employees. Total number is 17.000 (fte) and at the Veldhoven site 6.500 are located. After smooth entry procedures we embarked on a coffee in the huge canteen. 

Moore’s law

The topic our visit was: Power Electronics keeps ASML systems going.

Maarten gave a nice view on what ASML is all about: see to it that the industry can follow Moore’s law in an economical way.

So they went all the way from the first systems in 1984 (PAS2000) to the TwinScan NXE using an EUV light source in 2016. For EUV the lenses have been replaced by mirrors and the system operates in vacuum.

Next to the Scanner hardware more and more business of ASML is created by supporting services related to optimizing the wafer-quality.

Key technical issues are:

  • Stage accuracy (nm accuracy)

  • Overlay (nm accuracy)

  • Alignment (nm accuracy)

  • Throughput (wafers/hour, reliability)

High requirements should be met to enable reliable operation of the scanners to produce multilayer wafers. In these requirements power amplifiers and proper (feed forward) control play a major role.

Power Electronics is vital to the success of ASML is the summary of Maarten.

Power and High Voltage Electronics

High Power

Because of the vacuum inside EUV scanners new technology was needed to move and lift the wafer stage. A combination of coils and permanent magnets enables lifting the stage and moving the stages.

A typical number is the following: let’s project the 300 mm wafer on the Netherlands with a radius of around 300 km. That means that an accuracy requirement of the wafer of 10 nm corresponds to 10 mm in the projection.

That kind of accuracy is obtained by using a two-stage actuator. One with large displacement (1 m) and one with small displacement (1 mm). Motion control with a feedforward control loop ensures the desired accuracy.

The energy needed for these movements is large. The power supply has 150 kW-peak. But the energy is stored in the system so not much is really used. But still cooling (without vibrations) is crucial.

High voltage provides a solution to remove debris. In handling wafers (in vacuum) there will always be debris. So, these must be removed.

By extensive experiments with shapes and surface properties of moveable electrodes it was found that conductive as well as non-conductive particles can be removed.

 

Programma
 -  uur Reception with coffee, tea and cake
 -  uur Introduction ASML / Introduction Electronic Development. Presentation by Maarten Hoeks
 -  uur Power and High Voltage Electronics at ASML, Presentation by Jeroen van Duivenbode
 -  uur Experience Center Tour
 -  uur Networking and drinks (with Young ASML)